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Manufacturing Technology References

Intel: \'EUV Facts Don\'t Add Up\' for 22 nm in 2011 (2008), Semiconductor International, http://www.semiconductor.net/article/CA6553758.html

IBM rolls \'computational scaling\' for litho at 22-nm (2008), EE Times, http://www.eetimes.com/showArticle.jhtml?articleID=210602297

Second impression for nanoimprint (2007) EE Times, http://www.eetimes.com/showArticle.jhtml;jsessionid=ENZN2BULAASNUQSNDLRSKH0CJUNN2JVN?articleID=199902420

10 fab technologies on the hot seat (2008) EE Times, http://www.eetimes.com/showArticle.jhtml;jsessionid=ENZN2BULAASNUQSNDLRSKH0CJUNN2JVN?articleID=210604050

EUV most likely litho for 22-nm node, says IMEC\'s Ronse (2008), EE Times, http://www.eetimes.com/showArticle.jhtml;jsessionid=ENZN2BULAASNUQSNDLRSKH0CJUNN2JVN?articleID=211202013

Intel Silicon & Manufacturing Update (2007), Intel, http://download.intel.com/pressroom/kits/events/idffall_2007/BriefingSilicon&TechManufacturing.pdf

Nano World: Roadmap for nano-imprinting (2006), Physorg, http://www.physorg.com/news65451782.html

Chou et al (1996), J. Vac. Sci. Technol. B 14(6), Nov/Dec 1996, Nanoimprint lithography, Available at http://www.nanonex.com/nanoimprint.pdf

Mirkin Group, Northwestern University [Accessed 22 Jan 2009], http://chemgroups.northwestern.edu/mirkingroup/dpn.htm

Carlberg (2006), Development of Nano-Imprint Lithography for Applications in Electronics, Photonics and Life Sciences. Lund University Doctoral Thesis, http://www.patrickcarlberg.dk/Download%20area/Dissertation%20no%20articles.pdf

Introduction to Scanning Probe Lithography, Quate Group, Stanford University, http://www.stanford.edu/group/quate_group/Litho/LithoPages/Introduction/Introduction2.html

Nanoimprint lithography presses into manufacturing markets (2007), Small Times, http://www.smalltimes.com/articles/article_display.cfm?Section=ARCHI&C=Elect&ARTICLE_ID=286744&p=109

Balla et al (2008), J. Phys. D: Appl. Phys. 41, An assessment of the process capabilities of nanoimprint lithography